VSPARTICLE VSP-S1 Size Selector
The VSPARTICLE VSP-S1 Size Selector is a table-top, user-friendly nanoparticle size-selector that can be easily connected to the VSP-G1 Nanoparticle Generator.
- 1-10nm particles,0,1nm resolution
- Typical sample preparation time: 30-60min
- Real-time tracking of coverage
Reproducible samples with size selected nanoparticles in <60 minutes.
The VSPARTICLE VSP-S1 is a table-top, user-friendly nanoparticle size-selector that can be easily connected to the VSP-G1. Together, they enable the automated production of size-selected inorganic nanoparticle (1-10 nm) samples, with minimal effort. Compatible with any (semi-) conductive material (alloy or non-alloy), you simply select the size and wait for your sample to be ready. Typical sample preparation time is 30-60 minutes.
Size-dependent particle property screening made simple
Make particles of several sizes in the range of 1-10 nanometer to determine the activity as a function of particle size. The automatic preparation of catalytic samples with a 0.1nm resolution enables sequenced sample production in less than a day.
Unique features of the VSP-S1 In a combined setup with a VSP-G1
Size selection
- Select nanoparticle size between 1 and 10 nm
- Resolution ± 0.1 nm
- Particle size sequence possible (property screening)
- Modular system for optimal flexibility
Automated Production
- Fully automated production ensures optimal reproducibility
- Choose particle size and press start
Versatility
- Compatible with all (semi)-conductive materials
- Multi-element composition possible (alloy and non-alloy)
- Easily tune particle composition with electrodes and carrier gas
Clean particles
- Only inputs needed are power, electrodes and carrier gas
- Pure, model particles: No surfactants, precursor salts
- No influence of contaminants on particle properties
Technical specifications
| Power | 110–240V AC |
| Dimensions | Casing ca. 52×45×20 cm |
| Weight | ca. 15 kg |
| Display | 16×2 characters |
| Digital output | Secure wireless interface |
Operating window
| Target Electrode material | metals, metal oxides, alloys, semiconductors, carbon |
| Particle size | 1–10 nm ± 0.1 nm |
| Max substrate size | 10×10 mm |
| Max deposited area | 3×3 mm |
| Substrate types | e.g. (in-situ) TEM, Electrodes, (doped) Si chips |
| Surface coverage | 0.1–20 % |
| Deposition time | 1–30 minutes |
| Total sample prep. time | 30-60 minutes |
| Carrier gas | Ar, N2, Ar + O2, Ar + H2 |
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