Home Nanoparticle Generation VSPARTICLE VSP-A3 Impaction Deposition

VSPARTICLE VSP-A3 Impaction Deposition

Product Code:
66011
Manufacturer: VSPARTICLE
  • Grow a nanoporous oxide layer
  • Useful as catalyst support/sensitive material
  • Type of substrates: glass, Si, TEM grids, MEMS chips etc
  • Max. deposited area: ø3 mm

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The three VSP-A deposition accessories can be easily connected to the output of the VSP-G1, enabling any researcher to produce nanoparticle samples in a matter of hours, with minimal effort. Typical sample preparation time is 1-60 minutes. Go from hypothesis to result in the same day. 

Dispersed particles, Porous layers, Coated filters

With VSPARTICLE Accessories pure nanoparticles are generated and deposited on any kind of substrate. You can make a sample with dispersed particles, a nanoporous layer or coated filters with great material flexibility. You can use any kind of (semi)conductive source material: pure, alloys, compacted alloys, mixed materials, oxides and other combinations. 

The most used combinations between accessory, material and substrate for model catalyst and in-situ TEM:

Diffusion TEM grids, in-situ TEM/MEMS, SiOx
Applications In-situ TEM catalyst research, materials science, ...
Materials Metals, Metal oxides, Alloys, Semiconductors, Carbon

Max sample size: 

1 cm2
Impaction: TEM grids, in-situ TEM/MEMS, SiOx
Applications Catalysis, in-situ TEM, sensors, batteries
Materials Metals, Metal oxides, Alloys, Semiconductors, Carbon

Max functionalized surface area: 

around 3 mm

Filtration

Filters, active carbon membranes, nanospun wires

Applications

Catalysis, batteries, filter testing

Materials

Metals, Metal oxides, Alloys, Semiconductors, Carbon
Max filter diameter:  47 mm

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